Ulvac Rolls PECVD for Tandem PV Cells
by Staff, Semiconductor International, June 25, 2009
http://www.semiconductor.net/article/295730-Ulvac_Rolls_PECVD_for_Tandem_PV_Cells.php
Ulvac Inc. (Chigasaki, Japan) has developed a plasma-enhanced chemical vapor deposition (PECVD) system for microcrystalline silicon (μc-Si) deposition, aimed at tandem thin-film silicon photovoltaics. Ulvac, which sells turnkey lines for PV manufacturing, said the new system goes on sale next week and will be part of a turnkey line for tandem μc-Si solar cell production. (more…)